Question

An n-type semiconducting Si is obtained by doping intrinsic Si with :

How does the energy gap of an intrinsic semiconductor effectively change when doped with a (a) trivalent impurity, and (b) pentavalent impurity ? Justify your answer in each case.

Suppose a pure Si crystal has 5 × 10²⁸ atoms m⁻³. It is doped by 1 ppm concentration of boron. Calculate the concentration of holes and electrons, given that nᵢ = 1·5 × 10¹⁶ m⁻³. Is the doped crystal n-type or p-type ?

A pure semiconductor like Ge or Si, when doped with a small amount of suitable impurity, becomes an extrinsic semiconductor. In thermal equilibrium, the electron and hole concentration in it are related to the concentration of intrinsic charge carriers. A p-type or n-type semiconductor can be converted into a p-n junction by doping it with suitable impurity. Two processes, diffusion and drift take place during formation of a p-n junction. A semiconductor diode is basically a p-n junction with metallic contacts provided at the ends for the application of an external voltage. A p-n junction diode allows currents to pass only in one direction when it is forward biased. Due to this property, a diode is widely used to rectify alternating voltages, in half-wave or full wave configuration.